152×152mm FPD Photomask Substrate For Micro Nano Fabrication

152mm × 152mm Quartz Photomask Substrate For FPD Use

Applications

The fields of photolithography process, such as integrated circuit chip manufacturing, FPD (Flat Panel Display),

MEMS (Micro Electro Mechanical Systems), etc.

Working Principle

Mask is a graphic master mask commonly used in photolithography of micro-nano fabrication. The graphic structure

is formed on a transparent substrate by an opaque photomask, and then the graphic information is transferred to the

product substrate through an exposure process.

Features

Photomask Substrate for FPD use

Process Flow

→ Raw materials detection;

→ Rough grinding;

→ Rough polishing;

→ Mask cleaning;

→ Raw materials performance inspection;

→ Plated by chrome;

→ Mask performance testing;

→ Photoresist coating;

→ Packaging;

→ Transporting.

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152*152mm FPD Photomask Substrate

152*152mm micro nano fabrication FPD Photomask

FPD Photomask Substrate 152*152mm

152×152mm FPD Photomask Substrate For Micro Nano Fabrication Images