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6×6×0.25 Inches Quartz Photomask Substrate For Photolithography Process

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ZEIT Group

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6×6×0.25 Inches Quartz Photomask Substrate For Photolithography Process

Name: 66025 Inches Quartz Photomask Substrate For Photolithography Process
Brand: ZEIT
Price: 1 USD

Buy cheap 6×6×0.25 Inches Quartz Photomask Substrate For Photolithography Process product

Brand Name : ZEIT

Model Number : 6025

Certification : Case by case

Place of Origin : Chengdu, P.R.CHINA

MOQ : 1pcs

Price : Case by case

Payment Terms : T/T

Supply Ability : Case by case

Delivery Time : Case by case

Packaging Details : Wooden case

Material : Quartz

Shipping Terms : FEDEX, DHL, EMS, TNT, etc

Used in : photolithography process

Size : 6 inches × 6inches × 0.25 inches

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6 inches × 6inches × 0.25 inches Quartz Photomask Substrate For Chip Use

Applications

The fields of photolithography process, such as integrated circuit chip manufacturing, FPD (Flat Panel Display),

MEMS (Micro Electro Mechanical Systems), etc.

Working Principle

Mask is a graphic master mask commonly used in photolithography of micro-nano fabrication. The graphic structure

is formed on a transparent substrate by an opaque photomask, and then the graphic information is transferred to the

product substrate through an exposure process.

Features

Photomask Substrate for Chip use

Model / Material	Size	Processing Capacity
6025 / Quartz	6 inches × 6inches × 0.25 inches	Grinding, Polishing, Chrome Plating, Gluing

Process Flow

→ Raw materials detection;

→ Rough grinding;

→ Rough polishing;

→ Mask cleaning;

→ Raw materials performance inspection;

→ Plated by chrome;

→ Mask performance testing;

→ Photoresist coating;

→ Packaging;

→ Transporting.

Our Advantages

We are manufacturer.

Mature process.

Reply within 24 working hours.

Our ISO Certification

6×6×0.25 Inches Quartz Photomask Substrate For Photolithography Process

Parts Of Our Patents

6×6×0.25 Inches Quartz Photomask Substrate For Photolithography Process

Parts Of Our Awards and Qualifications of R&D

6×6×0.25 Inches Quartz Photomask Substrate For Photolithography Process

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6×6×0.25 Inches Quartz Photomask Substrate For Photolithography Process

6×6×0.25 Inches Quartz Photomask Substrate For Photolithography Process

6×6×0.25 inches Quartz Photomask

photolithography process Photomask Substrate

6×6×0.25 inches Quartz Photomask

6×6×0.25 Inches Quartz Photomask Substrate For Photolithography Process Images